DIGITIMES

Elon Musk, Jensen Huang see China closing lithography gap by 2030

While ASML executives explore how to scale extreme ultraviolet (EUV) lithography output beyond 110 units by 2028, China is pursuing indigenous advanced lithography systems. ASML plans to produce at least 80 EUV tools in 2027 and is investigating a further capacity increase of approximately 30% in 2028 to satisfy massive global capital expenditure in artificial intelligence (AI) infrastructure. However, the prospect of domestic Chinese tools raises long-term uncertainty over the lithography lands

作者 DIGITIMES

1 分钟阅读
Elon Musk, Jensen Huang see China closing lithography gap by 2030
Elon Musk, Jensen Huang see China closing lithography gap by 2030

有活动行业的新闻要分享吗?

提交新闻稿或信息,触达数千名活动行业专业人士。

联系我们→

更多Semiconductors & Microelectronics相关内容

相关洞察