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Beyond ASML: China rethinks EUV race with light-source strategy

China is trying to broaden the definition of the extreme ultraviolet (EUV) race. Rather than focusing only on building a domestic equivalent to ASML's lithography platform, Chinese researchers are exploring alternative EUV light sources that could improve energy efficiency, support semiconductor metrology and eventually provide new options for advanced lithography.

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Beyond ASML: China rethinks EUV race with light-source strategy
Beyond ASML: China rethinks EUV race with light-source strategy

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