DIGITIMES

Beyond ASML: China rethinks EUV race with light-source strategy

China is trying to broaden the definition of the extreme ultraviolet (EUV) race. Rather than focusing only on building a domestic equivalent to ASML's lithography platform, Chinese researchers are exploring alternative EUV light sources that could improve energy efficiency, support semiconductor metrology and eventually provide new options for advanced lithography.

Por DIGITIMES

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Beyond ASML: China rethinks EUV race with light-source strategy
Beyond ASML: China rethinks EUV race with light-source strategy

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