DIGITIMES

Beyond ASML: China rethinks EUV race with light-source strategy

China is trying to broaden the definition of the extreme ultraviolet (EUV) race. Rather than focusing only on building a domestic equivalent to ASML's lithography platform, Chinese researchers are exploring alternative EUV light sources that could improve energy efficiency, support semiconductor metrology and eventually provide new options for advanced lithography.

By DIGITIMES

1 min read
Beyond ASML: China rethinks EUV race with light-source strategy
Beyond ASML: China rethinks EUV race with light-source strategy

Got news to share with the events industry?

Submit a press release or story tip and reach thousands of event professionals.

Get in touch→

More in Semiconductors & Microelectronics

Related Insights