Semiconductor Engineering

Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)

Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” “In this study, we investigate an alternative Pt-W alloy as... » read more The post Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy o

By Semiconductor Engineering

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Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)
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