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  3. Exclusive: China's CAS institute charts DUV route to 3nm GAA without EUV

DIGITIMES

Exclusive: China's CAS institute charts DUV route to 3nm GAA without EUV

China's advanced semiconductor research has reached another milestone. The Institute of Microelectronics of the Chinese Academy of Sciences has established a gate-all-around (GAA) device development path for advanced process nodes below 3nm that does not rely on extreme ultraviolet (EUV) lithography as its core technology.

Continue with the complete report on the publisher’s website.

Read full article at DIGITIMES
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By DIGITIMES

17 September 2026|1 min read
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Semiconductors & Microelectronics
Exclusive: China's CAS institute charts DUV route to 3nm GAA without EUV
Exclusive: China's CAS institute charts DUV route to 3nm GAA without EUV
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